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| Автор: Annie Baudrant |
| Издательство: John Wiley & Sons Limited |
| Cтраниц: 1 |
| Формат: PDF |
| Размер: 0 |
| ISBN: 9781118601112 |
| Качество: excellent |
| Язык: |
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Описание:
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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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Пресс - релиз
string(4) "true"
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