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| Автор: Marja-Leena Kaariainen |
| Издательство: John Wiley & Sons Limited |
| Cтраниц: 1 |
| Формат: PDF |
| Размер: 0 |
| ISBN: 9781118747421 |
| Качество: excellent |
| Язык: |
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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